Si Target Silicon Sputtering Si Wafer Silicon Target Polycrystalline for TP and LCD
-
Payment
-
Origin
China Mainland
-
Minimum Order
1
-
Packing
Pieces
- Contact Now Start Order
- Description
Product Detail
Silicon is of gray metallic luster. It has diamond lattice and is hard and brittle. Melting point: 1410 °C, boiling point: 2355 °C, density: 2.33g/cm3, purity: 99.999%. It is semiconductor material. Depending on the dopant, it can be N or P type. The silicon wafer is manufactured through vacuum magnetic levitation smelting or casting into ingots earlier, and slicing, lapping and precision machining later. Nowadays it is widely used for metal ceramic, aerospace, optical fiber communication, STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor and other magnetron sputtering coating.
- Chromium Sputtering Target Cr Target Sputtering for TP and TFT 1 Pieces / (Min. Order)
- Aluminum Scandium Sputtering Target AlSc Target Aluminum Alloy for Glass and Onboard Navigation 1 Pieces / (Min. Order)
- Copper Nickel Sputtering Target CuNi Target Cu Alloy for STN, TP, TFT 1 Pieces / (Min. Order)
- Lanthanum Strontium Manganate Sputtering Target La0.7Sr0.3MnO3 Target LSMO Purity 99.9% for Solid Oxide Fuel Cell(SOFC) 1 Pieces / (Min. Order)
- Copper Sputtering Cu Target Copper Target for TP and LCD 1 Pieces / (Min. Order)
- Molybdenum Niobium Sputtering Target MoNb Target Mo Alloy Purity 99.9% for STN, TP and TFT 1 Pieces / (Min. Order)
- Aluminum Neodymium Sputtering Target AlNd Target Aluminum Alloy Purity 99.995% for STN, TP and TFT 1 Pieces / (Min. Order)
- Niobium Oxide Sputtering Target Nb2O5 Target Purity 99.99% for TP and TFT 1 Pieces / (Min. Order)